中國第一屆ALD學術交流會即將在上海隆重舉行

尊敬的老師，您好！

　　 我們非常真誠的邀請您及您的科研團隊參加將于2010年10月18日-10月19日在上海舉行的第一屆ALD學術交流會。

　　 這次大會是由芬蘭PICOSUN公司和復旦大學主辦，南京大學、中國科學院上海技術物理研究所、上海納米技術及應用國家工程研究中心和我們北京正通遠恒科技有限公司聯合承辦，旨在方便中國優秀科研工作者交流分享ALD技術的最新研究進展和相關領域的研究成果。

　　 報告人介紹

　　 這次會議我們非常榮幸得邀請到ALD技術方面很多資深的教授及研究者來做報告，簡介如下：

　　 張衛教授：1995年6月畢業于西安交通大學，獲博士學位。1995-1997年在復旦大學做博士后，1997年起任教于復旦大學，1999年晉升為教授。現任復旦大學微電子學系系主任、復旦-Novellus互連研究中心主任，“極大規模集成電路制造裝備及成套工藝”國家重大專項(02專項)總體組專家、上海市科學技術預見專家。在Applied Physics Letters、Journal of Applied Physics等國際期刊和會議上發表論文180多篇，申請ZL15項，合作出版學術著作1部。曾獲得教育部二等獎。

　　研究方向：集成電路工藝、微細加工技術和半導體器件。具體包括(1)先進銅互連工藝研究。如超低k互連介質，新型超薄擴散阻擋層，以及納米尺度Via填充工藝等；(2)原子層淀積(ALD)工藝研究。如ALD高k柵介質，基于ALD工藝的高密度MIM電容等；(3)新型存儲器。如納米晶存儲器、RRAM等；(4)基于納米線和納米管的晶體管，以及隧穿場效應晶體管(TFET)等新結構器件研究。

　　 Prof. Lauri Niinist?: was born in Helsinki, Finland, in 1941. He received his M.Sc. and D. Techn. Degrees from Helsinki University of Technology in 1968 and 1973, respectively. His doctoral research on the synthesis and crystal structures of metal sulfates and sulfides was partly conducted at the University of Stockholm in 1971-1972. Since 1977 he has been Professor of Inorganic Chemistry at TKK but also worked in France, USA, Austria, and Hungary. He started the world first academic research on ALD technology (originally known as ALE) in 198? and was instrumental in ALD technology development over three decays.

　　 Prof. Mikko Ritala: (born 1968) received his M.Sc. degree in 1991 from University of Turku, and Ph.D. degree in 1994 from University of Helsinki, both in inorganic chemistry. During 1995  -2003 he worked at University of Helsinki, first as a postdoctoral researcher and then as an academy research fellow, both posts granted by Academy of Finland. In 2003 he was nominated as a professor of inorganic materials chemistry at University of Helsinki.

　　 His main research activity is in Atomic Layer Deposition (ALD) of thin films for microelectronics and other applications. Real time reaction mechanism studies form an important part of this research. Another research area is preparation of nanostructured materials by for example templating with ALD and electrodeposition, and electrospinning of nanofibres. He has published about 280 papers and holds several patents. In 2007 he was nominated as ISI Highly Cited Author in the field of materials science. He is an instructor of the American Vacuum Society’s short course on Atomic layer Deposition and has given tutorials on the same topic also in other occasions. He has also given numerous invited talks in international conferences and has participated in organization of numerous international conferences.

　　Mikko Ritala is active in Finnish chemical societies. He has been a member of the board of the Finnish Chemical Society since 1999 (chairman 2002-2003, vice chairman 2000-2001), and a member of the board of the Association of Finnish Chemical Societies since 2001. Mikko Ritala is also a member of Finnish Academy of Science and Letters (2009).

　　 李愛東教授： 1988年在浙江大學化工系獲學士學位。1988－1994年在哈爾濱工業大學應用化學系工作，1993年獲得化學系碩士學位。1996年獲南京大學物理系理學博士學位。1996年至今，在南京大學材料系工作，從事科研和教學工作。2000年香港理工大學的訪問學者，2005年加州大學伯克利分校訪問學者。入選2004年教育部新世紀優秀人才計劃。主持和參與了國家自然科學基金、“973”、教育部、江蘇省和與國外公司的合作項目等多項課題。已在國際學術期刊上發表SCI論文90余篇。獲得中國發明ZL10項。研究方向：化學法制備科學（溶膠凝膠法、金屬有機氣相沉積法、原子層化學沉積法）：薄膜生長工藝、動力學、機理和微結構；自聚集制備科學；集成鐵電學基礎：鐵電薄膜和柵介電薄膜與硅的集成；有機極化功能聚合物材料的制備與極化特性。

　　 Dr. Wei-Min Li（黎微明博士）：(born 1967) received his M.Sc. and Ph.D. degrees in inorganic chemistry from University of Helsinki in 1994, and 2000 respectively. After graduation, he joined ASM Microchemistry Ltd. as a Senior Process Engineer for R&D of ALD technology. In 2006, he joined Silecs Oy and worked on process and development of siloxane polymers. He has held multiple managerial roles in process/application management, sales and marketing, product platform development and project management. With Picosun he holds the position of Application Director with emphasis on industrial applications of ALD technology.

　　 Dr. Wei-Min Li started work with ALD technology over fifteen years ago and was among the first Chinese worked in the field of ALD technology. He has gained experiences in thin film materials, processes and equipments for a wide range of applications in semiconductor, CMOS image sensor, flat panel display, and photovoltaic industries. He is an author or co-author of over 30 publications and an inventor of more than 10 patents/applications in the field of ALD.

　　 關于Picosun Oy

　　 Picosun是一家致力于開發和生產原子層沉積系統(ALD)的公司。ALD主要應用于微米和納米技術方面。在芬蘭，Picosun公司連續擁有ALD反應器生產的專有技術已經長達三十多年。Picosun公司坐落于芬蘭的Espoo，其美國總部在底特律。使用SUNALE型ALD系統的用戶遍布全球，包括頂級高校與科研機構。

　　 ALD技術背景介紹

　　 ALD技術于1974年由芬蘭PICOSUN公司的董事Tuomo Suntola博士發明，國外已經實現產業化，比如英特爾公司研發的45/32納米芯片中的高介電薄膜。由于該發明及其在ALD研究方面的杰出貢獻，Tuomo Suntola博士2004年榮獲歐洲SEMI獎。

　　 我們熱切的希望能夠給您提供一個與專家和同行交流的平臺。會議詳情請參閱附件，謝謝您的支持！

　　 報名方式：您可以回復郵件填寫報名回執或者通過電話與李曉明小姐聯系，報名參會。

　　 聯系電話：010-64415767-21，010-64448295-21，13810030243。

　　 郵箱：xmli@honoprof.com

　　 誠祝 ：身體健康，工作順利！